钼靶材Molybdenum Target 用途
广泛用于导电玻璃、STN/TN/TFT-LCD、光学玻璃、离子镀膜等行业，适用所有平面镀膜及旋转镀膜系统。 Widely used in conductive glass, STN/TN/TFT-LCD, optical glass, ion coating industries, with all applicable plane coating and spin coating system
依用户图纸要求 By users drawing
可生产钨溅射靶规格为：
The supply of molybdenum sputtering target size:
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材质material
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供货状态state
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最大供货尺寸 Max 宽width X 长Length mm
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钼 Mo 99.95%
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磨光ground
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300 x 1000
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钨 W 99.95%
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磨光ground
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300 X 600 ≤200； X 1000
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